At advanced process nodes, lithography weakpoints can exist in physical
...
To evaluate the quality of physical layout designs in terms of
manufactu...
At advanced process nodes, pattern matching techniques have been used in...
While standard cell layouts are drawn with minimum design rules to maxim...
Starting from 22-nm, a standard cell must be designed to be full
lithogr...
Pattern matching design verification has gained noticeable attention in
...
As compared to DRC rules, DFM rules are a list of selected recommended r...
While standard cell layouts are drawn with minimum design rules for maxi...